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Enplas Corporation Wins Patent Invalidation Proceeding

2016-04-27 12:05
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SAITAMA, Japan -- (BUSINESS WIRE) --

On April 13, 2016 the Japanese IP High Court (H27 GyoKe 10141) dismissed the appeal made by Seoul Semiconductor Co. Ltd. (“SSC”) from the decision of the Japanese Patent Office (the “JPO”) upholding the validity of Enplas’ LED light diffusing lens patent JP3875247 (invention for a light emitting device, surface light source device, display device, and light flux controlling member) (“JP’247”) in the invalidation proceeding initiated by SSC (Case No. 2014-800053).

In the invalidation proceeding, SSC sought a decision by the JPO of invalidity of JP’247, but on March 18, 2015 the JPO denied. SSC then filed an appeal with the IP High Court.

In dismissing SSC’s appeal, the IP High Court held that the JP’247 invention was fundamentally different from prior art presented by SSC and rejected SSC’s arguments.

The IP High Court’s decision reaffirms the validity of JP’247 and maintains JP’247.

Enplas has filed patents, utility models and designs worldwide to exclude others from making or selling lenses competitive with Enplas’ LED diffusion lenses and many of such patents, utility models and designs including JP’247 and corresponding foreign patents have issued.

We continue offering our customers the highest quality products based on our continual technical advancements.

 

View source version on businesswire.com: http://www.businesswire.com/news/home/20160426007008/en/

 

CONTACT:

Enplas Corporation
Daisuke Yokota
President
Inquiries:
Enplas Corporation
Takashi Sakai, +81-3-6268-0259
Senior Managing Director